INTERACTIVE DEMOS

Manufacturing

CNC Vibration Analysis Semiconductor Fab Yield Monitoring

A 300mm wafer fab processes 5,000 wafers/week through 400+ process steps. Yield excursions in photolithography or etch can destroy an entire lot worth $2M. The process engineering team needs to catch drift within minutes, not after the end-of-lot inspection.

⚠A photoresist thickness drift on Litho-Track-7 went undetected for 6 hours, scrapping 180 wafers ($780K) before the SPC chart was reviewed at shift change.

LIVEprocess_metrology

wafer_id	lot_id	tool_id	step	thickness_nm	uniformity_pct	defect_count	ts
W-44801	LOT-2290	LT-07	PHOTORESIST_COAT	1252.1	98.2	0	2024-03-15T06:00:12.000Z
W-44802	LOT-2290	LT-07	PHOTORESIST_COAT	1254.3	97.9	0	2024-03-15T06:03:45.000Z
W-44803	LOT-2290	LT-07	PHOTORESIST_COAT	1256.8	97.4	1	2024-03-15T06:07:18.000Z
W-44804	LOT-2290	LT-07	PHOTORESIST_COAT	1259.1	96.8	1	2024-03-15T06:10:51.000Z
W-44805	LOT-2290	LT-07	PHOTORESIST_COAT	1261.7	96.1	2	2024-03-15T06:14:24.000Z
W-44806	LOT-2290	LT-07	PHOTORESIST_COAT	1264.2	95.5	3	2024-03-15T06:17:57.000Z

Streaming SQLRunning

▶Ingest inline metrology measurements from Kafka✓

CREATE SOURCE process_metrology WITH (
  connector = 'kafka',
  topic = 'fab.metrology.inline',
  properties.bootstrap.server = 'broker:9092'
) FORMAT PLAIN ENCODE JSON;

▶Apply Western Electric SPC rules per tool✓

yield_alertsauto-updating

tool_id	parameter	deviation_sigma	consecutive_oor	lot_impact	alert_level
LT-07	thickness_nm	2.3	8	FULL_LOT	WARNING
LT-07	thickness_nm	2.8	12	FULL_LOT	WARNING
LT-03	thickness_nm	-0.3	0	PARTIAL_LOT	WATCH

✓RisingWave detects resist thickness on LT-07 trending 2.3 sigma above target for 12 consecutive wafers. Alert fires after wafer #8, saving 172 wafers from the excursion.

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